>>12830683What are you talking about anon? Pretty sure e-beam lithography is something else and requires a epitaxy layer (is that the word for the mask used? Idk been a while since I wrote my thesis on the subject and I have nearly forgotten everything).
Also the resolution for the deposition process with a normal SEM should be a couple nm on a good day. On a very good day you can get something like ~1nm resolution with very little co deposits (idk if thats the correct word in English).
Its not really etching but more of a deposition process of non volatile particles which are left over after a precursor gas has been dissociated in the focus of the electron/ion beam. Most often you are left with some kind of metal carbon particles which are adsorbed onto the surface of the substrate. Naturally your carbon content would be very high (>70%) which can give you a number of unwanted features.
Personally I never saw it done with a TEM but every piece of literature I have read suggests that a TEM could also be used for very precise deposition.
